Materials and Processes for Micro & Nano Technologies

Experimental Facilities

Systems for Thin-film Growth and Surface Treatments LPCVD ECR-PECVD and RF-PECVD Plasma Polymerization System High-temperature Magnetron Sputtering Multitarget Magnetron Sputtering Thermal Evaporator System Electron Beam Evaporator System CVD for CNT growth Processing Instruments Plasma Etching Fournace System Rapid Thermal Annealing RIE Anodic Bonder Hot Embossing Equipment Chemical Benches Powder Blaster Lithography: Standard Photolithography Electron Beam Lithography AFM/STM nanolithography Focused Ion Beam Laser Processing Biochemical Laboratory Structural Characterizations XRD Micro-Raman Spectrometer Micro FT-IR Spectrometer XPS Microscopies and surface morphology characterizations High resolution mechanical profiler Contact angle measurements SEM and Nanolithography System Field Emission SEM Focused Ion Beam AFM/MFM Optical Characterizations UV-Vis Spectrometer SNOM/AFM Fluorescence Microscopy Electrical Characterizations Set-up for I(V) measurement Set-up for C(V) measurement

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